Chemical and Physical Effects of the Carrier Gas on the Atmospheric Pressure PECVD of Fluorinated Precursors

摘要

The atmospheric pressure PECVD deposition and texturization of hydrophobiccoatings using liquid fluorinated C6F12 and C6F14 precursors are investigated.The effect of the carrier gas (argon and helium) is discussed in terms of thebehavior of the gas phase and of the characteristics of the deposited film.Mass spectrom-etry measurements indicate that the fragmentation is higher withargon while helium reacts very easily with oxygen impurities leading to theformation of CxFyOz compounds. These observations are consistent with thechemical composition of the films determined by XPS and the variation in thedeposition rate. Moreover, the streamers present in the argon discharge affectthe morphology of the surface by increasing the roughness, which leads to theincrease in the hydrophobicity of the coatings.